PMC · DOI:10.1021/acsanm.5c05590·December 31, 2025
Retraction of “N2/H2 Plasma-Enhanced Atomic Layer Deposition for SiO2 Gap Filling: Implications for Nanoelectronics in Semiconductor Manufacturing”
Sameh Okasha, Donald Munson, Jun Yoshikawa
Abstract
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Taxonomy
TopicsCopper Interconnects and Reliability · Semiconductor materials and devices · Plasma Diagnostics and Applications