# Retraction of “N2/H2 Plasma-Enhanced Atomic Layer Deposition for SiO2 Gap Filling: Implications for Nanoelectronics in Semiconductor Manufacturing”

**Authors:** Sameh Okasha, Donald Munson, Jun Yoshikawa

PMC · DOI: 10.1021/acsanm.5c05590 · 2025-12-31

## Full-text entities

- **Chemicals:** SiO2 (MESH:D012822), H2 (-), N2 (MESH:D009584)

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Source: https://tomesphere.com/paper/PMC12813967