Correction: Gong et al. Polishing Mechanism of CMP 4H-SiC Crystal Substrate (0001) Si Surface Based on an Alumina (Al2O3) Abrasive. Materials 2024, 17, 679
Juntao Gong, Weilei Wang, Weili Liu, Zhitang Song
Abstract
Genes, proteins, chemicals, diseases, species, mutations and cell lines named across the full text — each resolved to its canonical identifier and authoritative record.
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Taxonomy
TopicsAdvanced Surface Polishing Techniques · Advanced ceramic materials synthesis · Aluminum Alloys Composites Properties
In the original publication [1], there was an error regarding the affiliation for Juntao Gong. In addition to affiliation 1, the updated affiliations should include: “University of Chinese Academy of Sciences, No. 19, Yuquan Road, Shijingshan District, Beijing 100049, China”. The authors state that the scientific conclusions are unaffected. This correction was approved by the Academic Editor. The original publication has also been updated.
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