Systematic efficiency study of line-doubled zone plates
Felix Marschall, Joan Vila-Comamala, Vitaliy A. Guzenko, Christian, David
TL;DR
This paper investigates the efficiency of line-doubled zone plates, focusing on their fabrication process involving high aspect ratio HSQ templates and Ir coating for high-resolution x-ray imaging.
Contribution
It provides a systematic study of the fabrication and efficiency of line-doubled zone plates using electron-beam lithography and atomic layer deposition.
Findings
High aspect ratio HSQ templates enable nanoscale zone plate fabrication
Atomic layer deposition of Ir improves zone plate performance
Efficiency metrics for line-doubled zone plates are characterized
Abstract
Line-doubled Fresnel zone plates provide nanoscale, high aspect ratio structures required for efficient high resolution imaging in the multi-keV x-ray range. For the fabrication of such optics a high aspect ratio HSQ resist template is produced by electron-beam lithography and then covered with Ir by atomic layer deposition (ALD).
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