Diffusion of hydrogen in crystalline silicon
Sabrina Bedard, Laurent J. Lewis (Departement de physique et Groupe, de Recherche en Physique et Technologie des Couches Minces (GCM), Universite, de Montreal)

TL;DR
This study uses tight-binding molecular dynamics to calculate hydrogen diffusion in crystalline silicon, showing that long jumps dominate at high temperatures and that classical Arrhenius parameters can be extrapolated to low temperatures.
Contribution
It provides a detailed computational analysis of hydrogen diffusion in silicon, confirming previous results and clarifying the temperature dependence of diffusion mechanisms.
Findings
Long jumps dominate at high temperatures
No abrupt change in diffusion coefficient with decreasing temperature
Arrhenius parameters extrapolate to low temperatures
Abstract
The coefficient of diffusion of hydrogen in crystalline silicon is calculated using tight-binding molecular dynamics. Our results are in good quantitative agreement with an earlier study by Panzarini and Colombo [Phys. Rev. Lett. 73, 1636 (1994)]. However, while our calculations indicate that long jumps dominate over single hops at high temperatures, no abrupt change in the diffusion coefficient can be observed with decreasing temperature. The (classical) Arrhenius diffusion parameters, as a consequence, should extrapolate to low temperatures.
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