Comparison of Power Dependence of Microwave Surface Resistance of Unpatterned and Patterned YBCO Thin Film

TL;DR

This study compares the microwave surface resistance of unpatterned and patterned YBCO thin films, finding that patterning does not significantly affect their nonlinear microwave response or residual resistance.

Contribution

It provides experimental and modeled evidence that patterning YBCO thin films does not alter their microwave surface resistance or its power dependence.

Findings

Patterning does not affect residual microwave resistance.

No observable change in power dependence of R_S after patterning.

Modeled results agree with experimental data.

Abstract

The effect of the patterning process on the nonlinearity of the microwave surface resistance $R_S$ of YBCO thin films is investigated. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave $R_S$ of YBCO thin films was measured before and after the patterning process, as a function of temperature and the rf peak magnetic field in the film. The microwave loss was also modeled, assuming a $J_{rf}^2$ dependence of $Z_S(J_{rf})$ on current density $J_{rf}$. Experimental and modeled results show that the patterning has no observable effect on the microwave residual $R_S$ or on the power dependence of $R_S$.