Structure and energetics of the Si-SiO_2 interface
Yuhai Tu, J. Tersoff (IBM Yorktown Heights)

TL;DR
This paper investigates the atomic structure and energetics of the Si-SiO_2 interface, revealing a low-energy stripe pattern of Si-O-Si bridges that explains experimental observations, crucial for nanoscale device performance.
Contribution
It introduces a novel Monte Carlo method to identify low-energy atomic structures of the Si-SiO_2 interface, uncovering a specific ordered pattern.
Findings
Identified a low-energy stripe pattern of Si-O-Si bridges at the interface.
The structure explains several experimental observations.
The approach advances understanding of nanoscale interface properties.
Abstract
Silicon has long been synonymous with semiconductor technology. This unique role is due largely to the remarkable properties of the Si-SiO_2 interface, especially the (001)-oriented interface used in most devices. Although Si is crystalline and the oxide is amorphous, the interface is essentially perfect, with an extremely low density of dangling bonds or other electrically active defects. With the continual decrease of device size, the nanoscale structure of the silicon/oxide interface becomes more and more important. Yet despite its essential role, the atomic structure of this interface is still unclear. Using a novel Monte Carlo approach, we identify low-energy structures for the interface. The optimal structure found consists of Si-O-Si "bridges" ordered in a stripe pattern, with very low energy. This structure explains several puzzling experimental observations.
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