Non linear flux flow in TiN superconducting thin film
F. Lefloch, C. Hoffmann, O. Demolliens

TL;DR
This study investigates the nonlinear flux flow behavior in a 100 nm TiN superconducting thin film, revealing electronic instabilities and quasiparticle dynamics through detailed transport measurements under magnetic fields.
Contribution
It provides new insights into nonlinear flux flow and quasiparticle properties in TiN thin films, including electronic instability observations and parameter extraction.
Findings
Observation of electronic instability at high vortex velocities
Extraction of inelastic scattering time and diffusion length
Analysis of flux flow behavior in TiN thin film
Abstract
We have studied the superconducting behavior of 100 nm Titanium Nitride (TiN) thin film in a perpendicular magnetic field. We found a zero field transition temperature of 4.6 K and a slope in the H-T plane of -0.745 T/K. At 4.2 K, we have performed careful transport measurements by measuring both the differential resistivity and voltage as a function of a DC current. Our results are analyzed in the framework of linear and non linear flux flow behavior. In particular, we have observed an electronic instability at high vortex velocities and from its dependence with respect to the applied magnetic field, we can exctract the inelastic scattering time and diffusion length of the quasiparticles.
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