Charged impurity scattering limited low temperature resistivity of low density silicon inversion layers
S. Das Sarma, E. H. Hwang

TL;DR
This paper models the low-temperature resistivity of low-density silicon inversion layers, revealing a sharp quantum-classical transition and explaining anomalous temperature dependence in high-mobility MOSFETs.
Contribution
It provides a theoretical calculation of impurity scattering effects on resistivity, highlighting a quantum to classical crossover in low-density silicon inversion layers.
Findings
Sharp quantum to classical crossover in transport behavior
Non-monotonic temperature dependence of mobility
Qualitative explanation for observed resistivity anomalies
Abstract
We calculate within the Boltzmann equation approach the charged impurity scattering limited low temperature electronic resistivity of low density -type inversion layers in Si MOSFET structures. We find a rather sharp quantum to classical crossover in the transport behavior in the K temperature range, with the low density, low temperature mobility showing a strikingly strong non-monotonic temperature dependence, which may qualitatively explain the recently observed anomalously strong temperature dependent resistivity in low-density, high-mobility MOSFETs.
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