Population Inversion Induced by Resonant States in Semiconductors
M.A.Odnoblyudov (1, 2), I.N.Yassievich (1, 2), M.S.Kagan (3),, Yu.M.Galperin (4), X.H.Wang (1), K.A.Chao (1) ((1) Department of, Theoretical Physics, Lund University; (2) Ioffe Physico-Technical Institute, RAS, St.Petersburg, Russia; (3) Institute for Radioengineering and

TL;DR
This paper predicts a new mechanism for carrier population inversion in semiconductors caused by resonant states under electric fields, supported by calculations relevant to recent THz lasing experiments.
Contribution
It introduces a novel population inversion mechanism based on resonant state scattering, expanding understanding of semiconductor lasing phenomena.
Findings
Theoretical prediction of population inversion via resonant states.
Calculations for strained p-Ge support the mechanism.
Potential explanation for recent THz lasing observations.
Abstract
We present a theoretical prediction of a new mechanism for carrier population inversion in semiconductors under an applied electric field. The mechanism is originated from a coherent capture-emission type inelastic scattering of resonant states. We support our theory with concrete calculations for shallow acceptor resonant states in strained p-Ge where a lasing in THz frequency region has been recently observed.
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