Superconducting Material Diagnostics using a Scanning Near-Field Microwave Microscope
Steven M. Anlage, D. E. Steinhauer, C. P. Vlahacos, B. J. Feenstra, A., S. Thanawalla, Wensheng Hu, Sudeep K. Dutta, and F. C. Wellstood (University, of Maryland)

TL;DR
This paper introduces a scanning near-field microwave microscope capable of imaging superconducting materials at micron-scale resolution, providing quantitative data on properties like sheet resistance and critical temperature.
Contribution
The work presents a novel microwave microscopy technique for detailed, quantitative imaging of superconducting materials at micron-scale resolution.
Findings
Imaging of sheet resistance in superconducting thin films
Spatially resolved measurements of critical temperature (Tc)
Quantitative imaging of surface properties
Abstract
We have developed scanning near-field microwave microscopes which can image electrodynamic properties of superconducting materials on length scales down to about 2 m. The microscopes are capable of quantitative imaging of sheet resistance of thin films, and surface topography. We demonstrate the utility of the microscopes through images of the sheet resistance of a YBa2Cu3O7-d thin film wafer, images of bulk Nb surfaces, and spatially resolved measurements of Tc of a YBa2Cu3O7-d thin film. We also discuss some of the limitations of the microscope and conclude with a summary of its present capabilities.
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