Hopping Conduction in Uniaxially Stressed Si:B near the Insulator-Metal Transition
s. Bogdanovich, D. Simonian, S. V. Kravchenko, M. P. Sarachik, and R., N. Bhatt

TL;DR
This study investigates the low-temperature conductivity of p-type Si:B near the insulator-metal transition under uniaxial stress, revealing universal scaling behavior and emphasizing the importance of the prefactor in analyzing critical exponents.
Contribution
It provides a detailed analysis of the universal scaling of conductivity near the transition and clarifies the role of the prefactor, challenging previous assumptions of Mott variable-range hopping.
Findings
Conductivity collapses onto a universal scaling curve.
Prefactor proportional to square root of temperature is crucial for accurate analysis.
Conductivity does not follow Mott variable-range hopping in the critical region.
Abstract
Using uniaxial stress to tune the critical density near that of the sample, we have studied in detail the low-temperature conductivity of p-type Si:B in the insulating phase very near the metal-insulator transition. For all values of temperature and stress, the conductivity collapses onto a single universal scaling curve. For large values of the argument, the scaling function is well fit by the exponentially activated form associated with variable range hopping when electron-electron interactions cause a soft Coulomb gap in the density of states at the Fermi energy. The temperature dependence of the prefactor, corresponding to the T-dependence of the critical curve, has been determined reliably for this system, and is proportional to the square-root of T. We show explicitly that nevlecting the prefactor leads to substantial errors in the determination of the scaling parameters and the…
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