Simulations of energetic beam deposition: from picoseconds to seconds
Joachim Jacobsen, B.H. Cooper, and James P. Sethna

TL;DR
This paper introduces a hybrid simulation method combining kinetic Monte Carlo and molecular dynamics to model crystal growth via energetic beam deposition, capturing atomic mobility effects at realistic growth rates.
Contribution
The paper develops a novel multi-scale simulation approach that accurately models energetic beam deposition, integrating atomic-scale dynamics with surface diffusion over extended timescales.
Findings
Energy influences island and step densities.
Optimal energy for layer-by-layer growth identified (25 eV for Ag).
Energy-induced atomic mobility affects growth modes.
Abstract
We present a new method for simulating crystal growth by energetic beam deposition. The method combines a Kinetic Monte-Carlo simulation for the thermal surface diffusion with a small scale molecular dynamics simulation of every single deposition event. We have implemented the method using the effective medium theory as a model potential for the atomic interactions, and present simulations for Ag/Ag(111) and Pt/Pt(111) for incoming energies up to 35 eV. The method is capable of following the growth of several monolayers at realistic growth rates of 1 monolayer per second, correctly accounting for both energy-induced atomic mobility and thermal surface diffusion. We find that the energy influences island and step densities and can induce layer-by-layer growth. We find an optimal energy for layer-by-layer growth (25 eV for Ag), which correlates with where the net impact-induced downward…
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