Temperature-frequency scaling in amorphous niobium-silicon near the metal-insulator transition
Hok-Ling Lee (1), John P. Carini (1), David V. Baxter (1), and George, Gruner (2) ((1) Indiana University, Bloomington (2) UCLA)

TL;DR
This study investigates the frequency and temperature dependence of conductivity in amorphous niobium-silicon near the metal-insulator transition, revealing quantum-critical scaling behavior at low temperatures.
Contribution
It provides experimental evidence of temperature-frequency scaling in amorphous niobium-silicon, confirming theoretical predictions near quantum-critical points.
Findings
High-frequency conductivity follows a power-law in frequency ($ au^{1/2}$) in the quantum regime.
Temperature-frequency scaling observed below 16 K matches theoretical models.
Conductivity behavior supports the existence of quantum-critical dynamics in the material.
Abstract
Millimeter-wave transmission measurements have been performed in amorphous niobium-silicon alloy samples where the DC conductivity follows the critical temperature dependence . The real part of the conductivity is obtained at eight frequencies in the range 87--1040 GHz for temperatures 2.6 K and above. In the quantum regime () the real part of the high-frequency conductivity has a power-law frequency dependence . For temperatures 16 K and below the data exhibits temperature-frequency scaling predicted by theories of dynamics near quantum-critical points.
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