Diffusional Relaxation in Random Sequential Deposition

TL;DR

This paper investigates how rapid diffusional relaxation influences the random sequential deposition process, deriving analytical expressions for coverage over time and validating them through numerical simulations.

Contribution

It provides new analytical formulas for coverage dynamics in the presence of diffusional relaxation, supported by numerical validation.

Findings

Analytical expressions for coverage at short and long times.

Validation of theoretical results with numerical simulations.

Abstract

The effect of diffusional relaxation on the random sequential deposition process is studied in the limit of fast deposition. Expression for the coverage as a function of time are analytically derived for both the short-time and long-time regimes. These results are tested and compared with numerical simulations.