X-ray photoemission study of CoFeB/MgO thin film bi-layers
J.C. Read, P.G. Mather, and R.A. Buhrman

TL;DR
This study uses X-ray photoemission spectroscopy to analyze the formation and control of oxides and B content at the CoFeB/MgO interface in thin film bi-layers, revealing process-dependent oxidation and methods to manipulate interface composition.
Contribution
It provides new insights into interface oxidation processes and demonstrates how inserting an Mg layer can control B content in the MgO barrier.
Findings
Oxide formation at the interface depends on the deposition process.
Vacuum annealing reduces metal oxides but increases B incorporation.
Inserting Mg acts as an oxygen sink, controlling B content.
Abstract
We present results from an X-ray photoemission spectroscopy (XPS) study of CoFeB/MgO bi-layers where we observe process-dependent formation of B, Fe, and Co oxides at the CoFeB/MgO interface due to oxidation of CoFeB during MgO deposition. Vacuum annealing reduces the Co and Fe oxides but further incorporates B into the MgO forming a composite MgBxOy layer. Inserting an Mg layer between CoFeB and MgO introduces an oxygen sink, providing increased control over B content in the barrier.
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Taxonomy
TopicsAluminum Alloys Composites Properties · Magnetic properties of thin films · Metallurgical and Alloy Processes
