Probing Spin Accumulation in Ni/Au/Ni Single-Electron Transistors with Efficient Spin Injection and Detection Electrodes
R. S. Liu (1, 2), H. Pettersson (1, 2), L. Michalak (3), C. M., Canali (3), L. Samuelson (2) ((1)Center for Applied Mathematics and, Physics, Halmstad University, Halmstad, Sweden,(2)Solid State Physics/ the, Nanometer Structure Consortium, Lund University, Lund, Sweden

TL;DR
This study investigates spin accumulation in Ni/Au/Ni single-electron transistors with tunable tunnel resistances, finding no clear spin accumulation due to rapid spin relaxation in Au, and characterizes the spin injection efficiency of Ni electrodes.
Contribution
The paper introduces a novel fabrication method for hybrid Ni/Au/Ni single-electron transistors with real-time tunable tunnel resistances and provides insights into spin relaxation times and spin injection efficiency.
Findings
No clear spin accumulation observed in Au disc at 1.7 K.
Upper bound of a few nanoseconds on electron spin-relaxation time in Au.
Maximum TMR of 10% indicating 22% spin polarization in Ni electrodes.
Abstract
We have investigated spin accumulation in Ni/Au/Ni single-electron transistors assembled by atomic force microscopy. The fabrication technique is unique in that unconventional hybrid devices can be realized with unprecedented control, including real-time tunable tunnel resistances. A grid of Au discs, 30 nm in diameter and 30 nm thick, is prepared on a SiO2 surface by conventional e-beam writing. Subsequently, 30 nm thick ferromagnetic Ni source, drain and side-gate electrodes are formed in similar process steps. The width and length of the source and drain electrodes were different to exhibit different coercive switching fields. Tunnel barriers of NiO are realized by sequential Ar and O2 plasma treatment. Using an atomic force microscope with specially designed software, a single non-magnetic Au nanodisc is positioned into the 25 nm gap between the source and drain electrodes. The…
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