ECR Plasma assisted deposition of zinc nanowires

TL;DR

This paper reports on the synthesis of zinc nanowires using ECR plasma-assisted sputtering, analyzing their nanocrystalline and metallic properties through microscopy and diffraction techniques.

Contribution

It introduces a novel plasma-assisted method for depositing zinc nanowires with specific diameters and characterizes their structural and electrical properties.

Findings

Nanowires with diameters of 90-120 nm were successfully deposited.

The nanowires exhibit metallic and nanocrystalline characteristics.

Structural analysis confirmed the crystalline nature of the nanowires.

Abstract

Deposits of one-dimensional nanostructures of zinc with diameters of 90-120 nm have been obtained by means of sputtering in an Electron Cyclotron Resonance (ECR) plasma reactor. The sputtering has been made effective by using a negatively biased cylindrical target in a hollow cathode geometry. The nanocrystalline films deposited on the glass substrate were studied with scanning tunneling microscopy/spectroscopy and was found to consist of nanowires having metallic nature. The crystalline nature of these metallic nanowires was studied with x-ray diffraction analysis.