Novel Fabrication of Micromechanical Oscillators with Nanoscale Sensitivity at Room Temperature

TL;DR

This paper introduces a novel fabrication process for ultrasensitive micromechanical oscillators with nanoscale sensitivity at room temperature, enabling significant improvements in magnetic and force detection capabilities.

Contribution

The work presents a new high-yield fabrication method for ultrathin single-crystal silicon cantilevers with integrated magnetic structures, achieving unprecedented sensitivity improvements.

Findings

Magnetic moment sensitivity of 10^{-15} J/T at room temperature.

Force sensitivity of ~10^{-16} N in 1 Hz bandwidth.

Achieved nanometer-scale resolution in MRFM applications.

Abstract

We report on the design, fabrication, and implementation of ultrasensitive micromechanical oscillators. Our ultrathin single-crystal silicon cantilevers with integrated magnetic structures are the first of their kind: They are fabricated using a novel high-yield process in which magnetic film patterning and deposition are combined with cantilever fabrication. These novel devices have been developed for use as cantilever magnetometers and as force sensors in nuclear magnetic resonance force microscopy (MRFM). These two applications have achieved nanometer-scale resolution using the cantilevers described in this work. Current magnetic moment sensitivity achieved for the devices, when used as magnetometers, is 10^{-15} J/T at room temperature, which is more than a 1000 fold improvement in sensitivity, compared to conventional magnetometers. Current room temperature force sensitivity of MRFM cantilevers is ~10^{-16} N in a 1 Hz bandwidth, which is comparable to the room temperature sensitivities of similar devices of its type. Finite element modeling was used to improve design parameters, ensure that the devices meet experimental demands, and correlate mode shape with observed results. The photolithographic fabrication process was optimized, yielding an average of ~85% and alignment better than 1000 nm. Post-fabrication focused-ion-beam milling was used to further pattern the integrated magnetic structures when nanometer scale dimensions were required.