CVD of CrO2 Thin Films: Influence of the Deposition Parameters on their Structural and Magnetic Properties
A.F. Mota, A.J. Silvestre, P.M. Sousa, O. Conde, M.A. Rosa, M., Godinho
TL;DR
This study investigates how deposition parameters in atmospheric pressure CVD affect the structural and magnetic properties of CrO2 thin films, which are relevant for spintronics applications.
Contribution
It provides insights into the synthesis of highly oriented CrO2 films with specific magnetic properties using atmospheric pressure CVD.
Findings
Films exhibit a sharp magnetic transition at 375 K
Saturation magnetization close to bulk CrO2 value
Presence of highly oriented Cr2O3 in the films
Abstract
This work reports on the synthesis of CrO2 thin films by atmospheric pressure CVD using chromium trioxide (CrO3) and oxygen. Highly oriented (100) CrO2 films containing highly oriented (0001) Cr2O3 were grown onto Al2O3(0001) substrates. Films display a sharp magnetic transition at 375 K and a saturation magnetization of 1.92 Bohr magnetons per f.u., close to the bulk value of 2 Bohr magnetons per f.u. for the CrO2. Keywords: Chromium dioxide (CrO2), Atmospheric pressure CVD, Spintronics.
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsHeusler alloys: electronic and magnetic properties · Catalytic Processes in Materials Science