Morphological and Structural Characterization of Cro2/Cr2o3 Films Grown by Laser-CVD
P.M. Sousa, A.J. Silvestre, N. Popovici1, O. Conde

TL;DR
This study demonstrates the synthesis of Cr2O3 and CrO2 films via laser-assisted chemical vapor deposition, highlighting the importance of processing parameters in controlling phase composition and film quality.
Contribution
It introduces a method for co-depositing Cr2O3 and CrO2 films using laser-CVD with controlled parameters, advancing thin film fabrication techniques.
Findings
Successful synthesis of Cr2O3 and CrO2 films at room temperature.
Identification of key parameters for phase control, such as laser fluence and oxygen partial pressure.
Films exhibited the desired two-phase system with specific process conditions.
Abstract
This work reports on the synthesis of chromium (III, IV) oxides films by KrF laser-assisted CVD. Films were deposited onto sapphire substrates at room temperature by photodissociation of Cr(CO)6 in dynamic atmospheres containing oxygen and argon. A study of the processing parameters has shown that partial pressure ratio of O2 to Cr(CO)6 and laser fluence are the prominent parameters that have to be accurately controlled in order to co-deposit both crystalline oxide phases. Films consistent with such a two-phase system were synthesised for a laser fluence of 75 mJ cm-2 and a partial pressure ratio about 1. PACS: 81.15.Fg, 81.15.Kk, 81.05.Je
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