Domain imaging, MOKE and magnetoresistance studies of CoFeB films for MRAM applications
J.M. Teixeira, R.F.A. Silva, J. Ventura, A.M. Pereira, F. Carpinteiro,, J.P. Araujo, J.B. Sousa, S. Cardoso, R. Ferreira, P.P. Freitas

TL;DR
This study investigates the magnetic domain behavior, Kerr effect magnetometry, and magnetoresistance of CoFeB thin films, revealing how boron addition influences magnetic properties relevant for MRAM technology.
Contribution
It provides a detailed analysis of the magnetic processes in CoFeB films and compares their properties with CoFe films, highlighting the effects of boron on coercivity and switching behavior.
Findings
Boron reduces coercive and saturation fields in CoFeB films.
Magnetization processes include domain wall motion and moment rotation.
CoFeB films exhibit low coercivity and abrupt switching, suitable for MRAM.
Abstract
We present a detailed study on domain imaging, Kerr effect magnetometry (MOKE) and magnetoresistance (MR), for a series of 20 nm CoFeB thin films, both as-deposited (amorphous) and annealed (crystalline). By considering the two different (orthogonal) in-plane magnetization components, obtained by MOKE measurements, we were able to study the uniaxial anisotropy induced during CoFeB-deposition and to discriminate the magnetization processes under a magnetic field parallel and perpendicular to such axis. MOKE magnetic imaging enabled us to observe the dominant magnetization processes, namely domain wall motion and moment rotation. These processes were correlated with the behavior of the magnetoresistance, which depends both on short-range spin disorder electron scattering and on the angle between the electrical current and the spontaneous magnetization…
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Taxonomy
TopicsMagnetic properties of thin films · Magnetic Properties and Applications · Magnetic Properties of Alloys
