Surface and interface study of pulsed-laser-deposited off-stoichiometric NiMnSb thin films on Si(100) substrate

TL;DR

This study investigates how the surface, interface, and morphology of pulsed-laser-deposited NiMnSb thin films on Si(100) change with film thickness, revealing porosity development below 35 nm and its effects on transport and magnetic properties.

Contribution

It provides detailed insights into the morphological, transport, and magnetic properties of ultra-thin NiMnSb films as a function of thickness, highlighting porosity formation and its impact.

Findings

Porous layer forms below 35 nm thickness.

Porosity increases as film thickness decreases.

Magnetic and transport properties are unaffected by compositional inhomogeneity.

Abstract

We report a detailed study of surface and interface properties of pulsed-laser deposited NiMnSb films on Si (100) substrate as a function of film thickness. As the thickness of films is reduced below 35 nm formation of a porous layer is observed. Porosity in this layer increases with decrease in NiMnSb film thickness. These morphological changes of the ultra thin films are reflected in the interesting transport and magnetic properties of these films. On the other hand, there are no influences of compositional in-homogeneity and surface/interface roughness on the magnetic and transport properties of the films.