Controlled single electron transfer between Si:P dots
T. M. Buehler, V. Chan, A. J. Ferguson, A. S. Dzurak, F. E. Hudson, D., J. Reilly, A. R. Hamilton, R. G. Clark, D. N. Jamieson, C. Yang, C. I. Pakes, and S. Prawer

TL;DR
This paper demonstrates electrical control of silicon phosphorus double quantum dots with nanoscale precision, enabling single electron transfer detection, which advances silicon-based quantum computing components.
Contribution
It introduces a method to control and detect single electron transfer in phosphorus-doped silicon double dots with nanoscale dimensions.
Findings
Electron transfer observed with differential bias
Single electron transistors used as charge detectors
Potential for scaling to single-atom dots
Abstract
We demonstrate electrical control of Si:P double dots in which the potential is defined by nanoscale phosphorus doped regions. Each dot contains approximately 600 phosphorus atoms and has a diameter close to 30 nm. On application of a differential bias across the dots, electron transfer is observed, using single electron transistors in both dc- and rf-mode as charge detectors. With the possibility to scale the dots down to few and even single atoms these results open the way to a new class of precision-doped quantum dots in silicon.
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