High Throughput Oxide Lattice Engineering by Parallel Laser Molecular Beam Epitaxy and Concurrent X-ray Diffraction

TL;DR

This paper introduces a high-throughput oxide lattice engineering system combining laser molecular beam epitaxy with spatially-resolved x-ray diffraction, enabling rapid, atomically precise oxide superlattice fabrication and analysis.

Contribution

It presents a novel integrated system for atomically controlled oxide superlattice growth and spatially-resolved x-ray diffraction measurement based on combinatorial methodology.

Findings

Development of a dual-mask LMBE chamber with automated target stage

Implementation of a rapid, spatially-resolved x-ray diffraction mapping system

Enabling high-throughput, atomically precise oxide superlattice fabrication and analysis

Abstract

A novel laser molecular beam epitaxy (LMBE) system for the fabrication of atomically controlled oxides superlattices and an x-ray diffractometer that measures spatially-resolved x-ray diffraction spectra have been developed based on the concept of combinatorial methodology. The LMBE chamber has two moving masks, an automated target stage, a substrate heating laser, and an in-situ scanning reflection high-energy electron diffraction system. The x-ray diffractometer with a curved monochromator and two-dimensional detector is used for rapid concurrent x-ray diffraction intensity mapping with the two axes of the detector corresponding to the diffraction angle and a position in the sample.