Shape Transition of Nanostructures created on Si(100) surfaces after MeV Implantation

TL;DR

This study investigates how MeV Sb ion implantation alters the surface morphology of Si(100), revealing the formation and shape transition of nanostructures and changes in surface roughness at different fluences.

Contribution

It provides new insights into the shape transition of nanostructures on Si surfaces induced by high-energy ion implantation.

Findings

Elliptical nanostructures form on Si surfaces after implantation.

Nanostructures grow larger with increased fluence.

Shape transition from elliptical to circular occurs at high fluence.

Abstract

We have studied the modification in the Surface morphology of the Si(100) surfaces after 1.5 MeV Sb implantation. Scanning Probe Microscopy has been utilized to investigate the ion implanted surfaces. We observe the formation of nano-sized defect features on the Si surfaces for various fluences. These nanostructures are elliptical in shape and inflate in sizefor higher fluences. Furthermore, these nanostructures undergo a shape transition from an elliptical shape to a circular-like at a high fluence. We will also discuss the modification in surface roughness as a function of Sb fluence.