Dependence of Zinc Oxide Thin Films Properties on Filtered Vacuum Arc Deposition Parameters
T. David, S. Goldsmith, and R. L. Boxman
TL;DR
This study explores how varying oxygen pressure and arc current during filtered vacuum arc deposition affect the structural, compositional, electrical, and optical properties of zinc oxide thin films.
Contribution
It provides new insights into the relationship between deposition parameters and the resulting properties of ZnO thin films.
Findings
Higher oxygen pressure improves film uniformity.
Increased arc current enhances electrical conductivity.
Optical transparency varies with deposition conditions.
Abstract
The micro-properties (structure and composition), and macro-properties (electrical and optical properties) of zinc oxide (ZnO) thin films deposited on glass substrates using a filtere vacuum arc deposition (FVAD) system were investigated as a function of oxygen pressure (0.37 - 0.5 Pa) and arc current (100 - 300 A). Correlations between the various properties were investigated.
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