Reply to ``Comment on `Insulating Behavior of $\lambda$-DNA on the Micron Scale' "
Y. Zhang, R. H. Austin, E. C. Cox, N. P. Ong
TL;DR
This paper defends the original findings that vacuum-dried λ-DNA exhibits extremely high resistance, addressing and countering objections raised by critics to reinforce the validity of the experimental results.
Contribution
It provides a rebuttal to critiques of previous measurements, reaffirming the insulating behavior of vacuum-dried λ-DNA through counterarguments.
Findings
Resistance exceeds 10^14 Ω at 295 K
Counterarguments support original insulating conclusion
Reinforces validity of previous experimental results
Abstract
In our experiment, we found that the resistance of vacuum-dried -DNA exceeds at 295 K. Bechhoefer and Sen have raised a number of objections to our conclusion. We provide counter arguments to support our original conclusion.
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