High quality superconducting niobium films produced by Ultra High Vacuum Cathodic Arc

TL;DR

This paper introduces a novel Ultra High Vacuum Cathodic Arc system capable of producing ultra-pure niobium films with superior structural and electrical qualities at low deposition temperatures, expanding applications in ultra-pure film and plasma technologies.

Contribution

The paper presents the development of a UHVCA system that operates under ultra-high vacuum conditions, enabling the production of high-quality niobium films with minimal contamination.

Findings

Produced ultra-pure niobium films with excellent properties

Operates at deposition temperatures below 100°C

Enhances applications requiring ultra-pure films or plasmas

Abstract

The vacuum arc is a well-known technique to produce coating with enhanced adhesion and film density. Many cathodic arc deposition systems are actually in use in industry and research. They all work under (high) vacuum conditions in which water vapor pressure is an important source of film contamination, especially in the pulsed arc mode of operation. Here we present a Cathodic Arc system working under Ultra High Vacuum conditions (UHVCA). UHVCA has been used to produce ultra-pure niobium films with excellent structural and electrical properties at a deposition temperature lower than 100oC. The UHVCA technique therefore opens new perspectives for all applications requiring ultra-pure films or, as in the case of Plasma Immersion Ion Implantation, ultra-pure plasmas.