Mn12-acetate film pattern generated by photolithography methods
K. Kim (1), D.M. Seo (1), J. Means (1), V. Meenakshi (1), W. Teizer, (1), H. Zhao (2), K. R. Dunbar (2) ((1)Department of Physics, Texas A&M, University, College Station (2)Department of Chemistry, Texas A&M University,, College Station)

TL;DR
This paper presents a simple photolithography technique to create patterned Mn12-acetate films on silicon surfaces, preserving the complex's properties, enabling potential device fabrication.
Contribution
It introduces a novel lithographic process for Mn12-acetate films that maintains the chemical and magnetic integrity of the complex.
Findings
AFM confirms precise pattern dimensions
XPS shows the complex remains intact after patterning
Magnetic properties resemble those of crystalline Mn12-acetate
Abstract
We demonstrate a straightforward way to lithographically fabricate Mn12-acetate (Mn12O12(CH3COO)16(H2O)4 2CH3COOH 4H2O) thin film patterns on Si/SiO2 surfaces, a significant step in light of the chemical volatility of this organic complex. Atomic force microscopy (AFM) images of the film patterns allow the determination of the pattern dimensions. X-ray photoelectron spectroscopy (XPS) data indicate that the patterned material is the intact Mn12-acetate complex. Magnetic measurements of the Mn12-acetate film confirm that the film properties are reminiscent of crystalline Mn12-acetate, suggesting that this approach can be used to fabricate lithographically patterned devices of Mn12-acetate.
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