Random Deposition Model with a Constant Capture Length

TL;DR

This paper presents a new sequential particle deposition model with a fixed capture length, analyzing its statistical properties through numerical and analytical methods in one dimension.

Contribution

It introduces a novel deposition model with a constant capture length and provides a comprehensive analysis of its statistical behavior.

Findings

Model captures particle aggregation behavior effectively.

Analytical and numerical results agree on island distance distribution.

Provides insights into submonolayer deposition processes.

Abstract

We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance \ell, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution.