Quantitative study of molecular N_2 trapped in disordered GaN:O films

TL;DR

This study investigates the presence and behavior of molecular N_2 in disordered GaN:O films, revealing a correlation between nitrogen trapping, oxygen impurities, and structural disorder using spectroscopic techniques.

Contribution

It provides the first quantitative analysis of molecular N_2 in disordered GaN:O films and links nitrogen trapping to impurity levels and structural disorder.

Findings

4-21% of nitrogen exists as molecular N_2

N_2 interacts weakly with the matrix

N_2 fraction correlates with oxygen impurities and disorder

Abstract

The structure of disordered GaN:O films grown by ion-assisted deposition is investigated using x-ray absorption near-edge spectroscopy and Raman spectroscopy. It is found that between 4 and 21 % of the nitrogen in the films is in the form of molecular N_2 that interacts only weakly with the surrounding matrix. The anion to cation ratio in the GaN:O host remains close to unity, and there is a close correlation between the N_2 fraction, the level of oxygen impurities, and the absence of short-range order in the GaN:O matrix.