Influence of the gate dielectric on the mobility of rubrene single-crystal field-effect transistors
A. F. Stassen, R. W. I. de Boer, N. N. Iosad, A. F. Morpurgo

TL;DR
This study shows that in rubrene single-crystal FETs, the charge carrier mobility decreases as the dielectric constant of the gate insulator increases, highlighting the interface's intrinsic role.
Contribution
It reveals that the mobility reduction is proportional to the inverse of the dielectric constant, emphasizing the importance of the interface in organic FET performance.
Findings
Mobility decreases with higher dielectric constant
Reproducible device characteristics across materials
Mobility is an intrinsic property of the interface
Abstract
We have performed a comparative study of rubrene single-crystal field-effect transistors fabricated using different materials as gate insulator. For all materials, highly reproducible device characteristics are obtained. The achieved reproducibility permits to observe that the mobility of the charge carriers systematically decreases with increasing the dielectric constant of the gate insulator, the decrease being proportional to (epsilon)-1. This finding demonstrates that the mobility of carriers in organic single-crystal field-effect transistors is an intrinsic property of the crystal/dielectric interface and that it does not only depend on the specific molecule used.
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
