Investigation of laser ablated ZnO thin films grown with Zn metal target: a structural study

TL;DR

This study investigates how varying growth conditions in pulsed laser deposition affect the structural quality of ZnO thin films grown on Al2O3 substrates using a Zn metal target.

Contribution

It provides a detailed analysis of the relationship between deposition parameters and structural properties of ZnO films, offering insights into optimizing film quality.

Findings

Higher deposition temperature improves film crystallinity

Optimal oxygen pressure reduces defects in ZnO films

Structural quality correlates with stress and epitaxy degree

Abstract

High quality ZnO thin films were gown using the pulsed laser deposition technique on (0001) Al$_2$O$_3$ substrates in an oxidizing atmosphere, using a Zn metallic target. We varied the growth conditions such as the deposition temperature and the oxygen pressure. First, using a battery of techniques such as x-rays diffraction, Rutherford Backscattering spectroscopy and atomic force microscopy, we evaluated the structural quality, the stress and the degree of epitaxy of the films. Second, the relations between the deposition conditions and the structural properties, that are directly related to the nature of the thin films, are discussed qualitatively. Finally, a number of issues on how to get good-quality ZnO films are addressed.