Field Theoretical Approach to Electrochemical Deposition

TL;DR

This paper applies a lambda-phi^4 field theoretical model to electrochemical deposition, linking it to lattice-gas models and comparing mean field results with simulations and experiments.

Contribution

It introduces a field theoretical approach to electrochemical deposition, establishing parameter relationships and validating the model against data.

Findings

The lambda-phi^4 model effectively describes electrochemical deposition.

Parameter relationships between models are established.

Mean field results align with numerical and experimental data.

Abstract

In this work we present an application of the lambda-phi^4 field theoretical model to the adsorption of atoms and molecules on metallic surfaces - the electrochemical deposition. The usual approach to this system consists in the computational simulation using Monte Carlo techniques of an effective lattice-gas Hamiltonian. We construct an effective model towards a comparison between the lattice-gas Hamiltonian and the discrete version of the lambda-phi^4 Hamiltonian, obtaining the relationships between the model parameters and electrochemical quantities. The lambda-phi^4 model is studied in the mean field approximation, and the results are fitted and compared to numerical simulated and experimental data.