Electrostatic potential profiles of molecular conductors

TL;DR

This paper investigates how the electrostatic potential profiles in molecular conductors are influenced by geometry and environment, affecting their electronic transport properties and I-V characteristics.

Contribution

It presents a self-consistent method combining Poisson's equation and NEGF to analyze potential profiles in various molecular and nanoscale conductors.

Findings

Thicker conductors exhibit better transverse screening.

Potential profiles significantly influence molecular level alignment.

Gate voltage can switch the I-V behavior from resonant to saturating.

Abstract

The electrostatic potential across a short ballistic molecular conductor depends sensitively on the geometry of its environment, and can affect its conduction significantly by influencing its energy levels and wave functions. We illustrate some of the issues involved by evaluating the potential profiles for a conducting gold wire and an aromatic phenyl dithiol molecule in various geometries. The potential profile is obtained by solving Poisson's equation with boundary conditions set by the contact electrochemical potentials and coupling the result self-consistently with a nonequilibrium Green's function (NEGF) formulation of transport. The overall shape of the potential profile (ramp vs. flat) depends on the feasibility of transverse screening of electric fields. Accordingly, the screening is better for a thick wire, a multiwalled nanotube or a close-packed self-assembled monolayer (SAM), in comparison to a thin wire, a single-walled nanotube or an isolated molecular conductor. The electrostatic potential further governs the alignment or misalignment of intramolecular levels, which can strongly influence the molecular I-V characteristic. An external gate voltage can modify the overall potential profile, changing the current-voltage (I-V) characteristic from a resonant conducting to a saturating one. The degree of saturation and gate modulation depends on the metal-induced-gap states (MIGS) and on the electrostatic gate control parameter set by the ratio of the gate oxide thickness to the channel length.