Deposition of Cu2Ta4O12 by pulsed laser deposition

TL;DR

This paper reports the successful deposition of Cu2Ta4O12 thin films using pulsed laser deposition, analyzing how process parameters affect film structure and morphology, with detailed characterization of the resulting films.

Contribution

It provides a detailed experimental methodology and analysis of Cu2Ta4O12 film deposition, highlighting the effects of various deposition parameters on film quality.

Findings

Crystalline structure depends on substrate temperature and oxygen pressure.

Surface morphology varies with deposition conditions.

Ta2O5 phase formation influences film growth orientation.

Abstract

Cu2Ta4O12 (CTaO) thin films were successfully deposited on Si(100) substrates by pulsed-laser deposition technique. The crystalline structure and the surface morphology of the CTaO thin films were strongly affected by substrate temperature, oxygen pressure and target - substrate distance. In general during deposition of CTaO the formation of a Ta2O5 phase appeared, on which CTaO grew with different orientations. We report on the experimental set-up, details for film deposition and the film properties determined by SEM, EDX and XRD.