Ultrafast photoinduced reflectivity transients in $(Nd_{0.5}Sr_{0.5})MnO_3$
T. Mertelj (1,2), D. Mihailovic (1,2), Z. Jagli\v{c}i\v{c} (3), A. A., Bosak (4), O. Yu. Gorbenko (4), A. R. Kaul (4),((1) Jozef Stefan, Institute, Ljubljana, Slovenia, (2) University of Ljubljana, Faculty of, Mathematics, Physics, (3) Institute for Mathematics, Physics and

TL;DR
This study investigates the ultrafast photoinduced reflectivity in Nd$_{0.5}$Sr$_{0.5}$MnO$_{3}$ thin films, revealing complex temperature-dependent behaviors across different timescales and their relation to phase transitions and film inhomogeneity.
Contribution
It provides detailed analysis of ultrafast reflectivity transients in Nd$_{0.5}$Sr$_{0.5}$MnO$_{3}$, highlighting the different temperature sensitivities on sub-ps and ps timescales and their connection to phase transitions.
Findings
Sub-ps response weakly sensitive to metal-insulator transition.
Slower response correlates with phase transition.
Inhomogeneity affects ultrafast dynamics.
Abstract
The temperature dependence of ultrafast photoinduced reflectivity transients is reported in NdSrMnO thin film. The photoinduced reflectivity shows a complex response with very different temperature dependences on different timescales. The response on the sub-ps timescale appears to be only weakly sensitive to the 270K-metal-insulator phase transition. Below K the sub-ps response displays a two component behavior indicating inhomogeneity of the film resulting from the substrate induced strain. On the other hand, the slower response on the 10-100 ps timescale is sensitive only to the metal-insulator phase transition and is in agreement with some previously published results. The difference in the temperature dependences of the responses on nanosecond and s timescales indicates that thermal equilibrium between the different degrees of fredom is…
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