Tailoring the photonic bandgap of porous silicon dielectric mirror

TL;DR

This paper presents a systematic method for fabricating porous silicon photonic crystals with a broad photonic bandgap up to 2000nm, highlighting the importance of high refractive index contrast for tunability.

Contribution

It introduces a new fabrication approach for porous silicon photonic crystals with large bandgaps and demonstrates their tunability and potential for various applications.

Findings

Photonic bandgap up to 2000nm achieved

Large refractive index contrast enables broad PBG structures

Potential applications in photonic devices

Abstract

A systematic method to fabricate porous silicon one dimensional photonic crystals has been engineered to have a photonic bandwidth up to 2000nm. The observation of the tailorability of the photonic bandgap (PBG) underscores the requirement of the large refractive index contrast for making broad PBG structures. In this letter, we present the fabrication and characteristics of such structures that may be promising structures for a large variety of applications.