Nanolithography based on real-time electrically-controlled indentation with an atomic force microscope for nanocontacts elaboration

TL;DR

This paper introduces a precise nanolithography technique using a modified atomic force microscope for real-time resistance-controlled indentation, enabling the fabrication of nanocontacts in the 1-10 nm² range.

Contribution

The study presents a novel AFM-based nanolithography method that uses real-time electrical resistance feedback to accurately control indentation for nanocontact fabrication.

Findings

Nanocontacts of 1-10 nm² were successfully fabricated.

Real-time resistance measurement improves indentation accuracy.

The method is applicable to various conductive structures.

Abstract

We report on the fabrication of nanocontacts by indentation of an ultrathin insulating photoresist layer deposited on various types of conductive structures. A modified atomic force microscope (AFM) designed for local resistance measurements is used as a nanoindenter. The nanoindentation is performed while measuring continuously the resistance between the conductive tip of the AFM and the conductive layer, which is used as the trigger parameter to stop the indentation. This allows an extremely accurate control of the indentation process. The indented hole is subsequently filled by a metal to create a contact on the underlying layer. We show that nanocontacts in the range of 1 to 10 nm2 can be created with this technique.