Height Fluctuations and Intermittency of $V_2 O_5$ Films by Atomic Force Microscopy

TL;DR

This study investigates the surface roughness and height fluctuation intermittency of V2O5 films using atomic force microscopy, finding no intermittency and explaining roughness through Kuramoto-Sivashinsky simulations.

Contribution

It introduces two methods to analyze height fluctuation intermittency and confirms the absence of intermittency in V2O5 films, linking results to Kuramoto-Sivashinsky modeling.

Findings

No intermittency detected in height fluctuations.

Roughness and exponents explained by Kuramoto-Sivashinsky simulations.

Surface roughness characterized by spatial scaling laws.

Abstract

The spatial scaling law and intermittency of the $V_2 O_5$ surface roughness by atomic force microscopy has been investigated. The intermittency of the height fluctuations has been checked by two different methods, first, by measuring scaling exponent of q-th moment of height-difference fluctuations i.e. $C_q = < |h(x_1) - h(x_2)|^{q} >$ and the second, by defining generating function $Z(q,N)$ and generalized multi-fractal dimension $D_q$. These methods predict that there is no intermittency in the height fluctuations. The observed roughness and dynamical exponents can be explained by the numerical simulation on the basis of forced Kuramoto-Sivashinsky equation.