Magnetic anisotropy and magnetoresistance of sputtered [(FeTaN)/(TaN)](n) multilayers
H.B. Nie, S. Y. Xu, J. Li, C.K. Ong, J.P. Wang

TL;DR
This study investigates how varying TaN layer thickness in sputtered [(FeTaN)/(TaN)](n) multilayers influences magnetic anisotropy, coercivity, grain size, and magnetoresistance, revealing a transition from uniaxial to biaxial anisotropy and oscillatory behavior with layer number.
Contribution
It demonstrates the interlayer coupling effects on magnetic properties and anisotropy evolution in multilayers, highlighting differences from single-layer FeTaN films.
Findings
Coercivity, grain size, and MR amplitude decrease then increase with TaN thickness.
Transition from uniaxial to biaxial anisotropy occurs around 4.0 nm of TaN.
Magnetoresistance effects are mainly due to anisotropic MR (AMR).
Abstract
We studied the in-plane magnetic anisotropy of rf (radio frequency) sputtered [(FeTaN)/(TaN)](n) multilayers synthesized on Si substrates. In the multilayers where n=5, the FeTaN thickness is fixed at 30 nm and the thickness of TaN, t(TaN), is varied from 0 to 6.0 nm, we observed a clear trend that, with increasing t(TaN), the values of coercivity, grain size, and amplitude of maximum magnetoresistance (MR) of the samples all decrease first and then increase after reaching a minimum when t(TaN) is around 2.0-4.0 nm. This trend is also associated with an evolution of in-plane magnetic anisotropy, where the multilayers change from uniaxial anisotropy to biaxial at t(TaN) around 4.0 nm and above. We attribute the phenomena to the interlayer coupling effect of FeTaN films as a function of the coupling layer (TaN) thickness, rather than to the thickness dependence observed in single-layered…
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Taxonomy
TopicsMagnetic properties of thin films · Metal and Thin Film Mechanics · Heusler alloys: electronic and magnetic properties
