Structural Studies on Semiconducting Hydrogenated Amorphous Silicon Oxide Films

TL;DR

This study investigates how oxygen incorporation affects the structural, optical, and electronic properties of hydrogenated amorphous silicon oxide films, revealing phase separation, increased disorder, and the role of Si-OH bonds.

Contribution

It provides a systematic analysis of the relationship between oxygen content, structural changes, and optoelectronic properties in a-SiO:H films, highlighting the formation of Si-OH bonds and phase separation effects.

Findings

Oxygen increases optical gap and structural disorder.

Si-OH bonds help maintain photosensitivity.

Higher oxygen leads to phase separation and reduced hydrogen content.

Abstract

In hydrogenated amorphous silicon oxide (a-SiO:H) films, incorporation of oxygen enhances optical gap due to a large number of St-O-Si bond formation, which lies deep into valence band states. An induction effect of this Si-O on other bonds within the network also takes place. At higher oxygen content micro-void forms and bonded hydrogen accumulates in di and/or polyhydride form. At this stage a phase separation of Si-rich and O-rich region taking place. A peak shift of absorption spectra within 1850 - 2250 cm-1, towards higher wave number is continuous. A gradual increase and broadening of 850 cm-1 absorption band on both sides of peak position indicate higher structural disorder in network formation. It may be considered that the stretching vibration of-OH bonded to Si gives rise to 780 cm-1 absorption band. This Si-OH formation is beneficial which prevents deterioration in photosensitivity due to reduction in bonded hydrogen content. Hydrogen content is found reducing as oxygen content increases from zero to ~15 at.%. A systematic study is carried out to correlate the optoelectronic property with local atomic arrangement.