Drain Voltage Scaling in Carbon Nanotube Transistors
M. Radosavljevic, S. Heinze, J. Tersoff, and Ph. Avouris

TL;DR
This paper investigates how reducing oxide thickness in CNFETs necessitates scaling the drain voltage to prevent exponential increases in Off-current caused by Schottky barrier modulation, providing a practical scaling rule.
Contribution
It introduces a specific drain voltage scaling rule for CNFETs with thin oxides to control Off-current and improve device performance.
Findings
Scaling drain voltage is essential for thin-oxide CNFETs.
Exponential Off-current increase occurs without voltage scaling.
Light emission is observed at high Off-current conditions.
Abstract
While decreasing the oxide thickness in carbon nanotube field-effect transistors (CNFETs) improves the turn-on behavior, we demonstrate that this also requires scaling the range of the drain voltage. This scaling is needed to avoid an exponential increase in Off-current with drain voltage, due to modulation of the Schottky barriers at both the source and drain contact. We illustrate this with results for bottom-gated ambipolar CNFETs with oxides of 2 and 5 nm, and give an explicit scaling rule for the drain voltage. Above the drain voltage limit, the Off-current becomes large and has equal electron and hole contributions. This allows the recently reported light emission from appropriately biased CNFETs.
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