Electron Cascades Produced by Photoelectrons in Diamond
Beata Ziaja, Abraham Szoeke, Janos Hajdu

TL;DR
This study uses Monte Carlo simulations to analyze the space-time evolution of secondary electron cascades in diamond caused by photoelectrons with energies between 0.5-12 keV, providing insights into ionization processes relevant for X-ray irradiation damage.
Contribution
The paper extends existing models of low-energy electron cascades to higher energies typical of photoelectrons, offering detailed 3D and temporal analysis of electron cloud dynamics in diamond.
Findings
Electron emission saturates within about 100 fs after impact.
Total electrons liberated are <= 400 at 1000 fs for 12 keV impact.
Cascade evolution transitions from anisotropic to isotropic scattering over time.
Abstract
Secondary electron cascades are responsible for significant ionizations in macroscopic samples during irradiation with X-rays. A quantitative analysis of these cascades is needed, e.g. for assessing damage in optical components at X-ray free-electron lasers, and for understanding damage in samples exposed to the beam. Here we present results from Monte Carlo simulations, showing the space-time evolution of secondary electron cascades in diamond. These cascades follow the impact of a single primary electron at energies between 0.5-12 keV, representing the usual range for photoelectrons. The calculations describe the secondary ionizations caused by these electrons, the three-dimensional evolution of the electron cloud, and monitor the equivalent instantaneous temperature of the free-electron gas as the system cools during expansion. The dissipation of the impact energy proceeds…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsDiamond and Carbon-based Materials Research · Advanced Surface Polishing Techniques · Integrated Circuits and Semiconductor Failure Analysis
