Evidence of potential sputtering of ultra-thin Pt films due to impact of multi-charged Ar ions
D.Ghose, P.Karmakar
TL;DR
This study investigates how highly charged argon ions cause potential sputtering in ultra-thin platinum films, revealing increased erosion with higher ion potential energy.
Contribution
It provides experimental evidence of potential sputtering effects on ultra-thin platinum films caused by multi-charged argon ions, highlighting the role of ion charge state.
Findings
Enhanced erosion of Pt films with increasing ion potential energy
Potential sputtering effect observed for highly charged Ar ions
Implications for thin film durability in ion-rich environments
Abstract
The phenomenon of potential sputtering of ultra-thin Pt films due to impact of 20 keV highly charged (q = 3 - 8) ions has been investigated. The results show enhanced erosion of the Pt film with the increase of potential energy of the Ar projectile.
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