RK/100 and RK/200 Quantum Hall Array Resistance Standards

TL;DR

This paper reports the development and fabrication of large-scale Quantum Hall Array Resistance Standards (QHARS) with 50 and 100 Hall bars, demonstrating precise quantization and potential for advanced resistance metrology.

Contribution

First fabrication of large N (50, 100) quantum Hall array resistance standards using a triple connections technique, confirming their quantized resistance and dissipation-less transport.

Findings

Resistance stays within 5 parts in 10^9 of RK/2N at 1.3 K and 2 mA

Hall bars exhibit dissipation-less carrier transport

QHARS extend quantum Hall effect applications

Abstract

It is theoretically possible to combine several Hall bars in arrays to define new quantum standards with perfectly quantized resistance values. We have thus, for the first time, developed and fabricated novel Quantum Hall Array Resistance Standards (QHARS) made of a large number N (N=100, 50) of Hall bars placed in parallel using a triple connections technique. The Hall resistance of these quantum standards is found to be very well quantized. On the i=2 Hall plateau, the resistance of specific good arrays stays equal to RK/2N within 5 parts in 10^9 for supplying currents up to 2 mA at a 1.3 K temperature. The mean longitudinal resistance of the Hall bars which constitute the arrays has been determined through the analysis of the array equivalent electrical circuit. This measurement shows that the carrier transport in the Hall bars is dissipation-less. This work therefore demonstrates the efficiency of the multiple connections technique and consequently that QHARS are likely to extend the QHE metrological applications.