Weak-localization type description of conduction in the "anomalous" metallic state
B. L. Altshuler, G. W. Martin, D. L. Maslov, V. M. Pudalov, A. Prinz,, G. Brunthaler, G. Bauer

TL;DR
This paper investigates the temperature-dependent resistivity in Si-MOS samples within the metallic phase, identifying three behavioral regimes and demonstrating that weak-localization theory explains the observed phenomena.
Contribution
It provides a comprehensive analysis of resistivity behavior across different temperature regimes and confirms the applicability of weak-localization theory to the metallic state.
Findings
Identification of three distinct temperature regimes in resistivity behavior.
Observation of a resistivity minimum at higher densities consistent with weak-localization theory.
Explanation of the absence of a resistivity minimum at lower densities due to experimental limitations.
Abstract
This paper is devoted to the temperature dependence of the resistivity in Si- MOS samples over the wide range of densities in the ``metallic phase'' (n>n_c) but not too close to the critical density n_c. Three domains of different behavior in \rho(T) are identified. These are: [i] quantum domain of `low-temperatures', where a logarithmic T-dependence of \rho (with ) dominates; [ii] semi-classical domain of `high-temperatures', in which Drude resistivity strongly varies with T (with d\rho/dT>0); and [ii] crossover between the former two, where a linear T-dependence dominates (with d\rho/dT>0). In the crossover regime and at higher densities (n>20x10^{11}/cm^2), \rho(T) goes through a minimum at temperature T_{min}. Both the absolute value of T_{min} and its dependence on density are found to be in an agreement with the conventional weak-localization theory. For n smaller than…
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Taxonomy
TopicsSurface and Thin Film Phenomena · Semiconductor materials and interfaces · Semiconductor materials and devices
