# Research on Multi-Frequency Vibration Dynamic Compensation Scheme for Electron Beam Inspection Equipment

**Authors:** Junhai Jiang, David Wei Zhang, Ziyu Liu

PMC · DOI: 10.3390/mi17030336 · Micromachines · 2026-03-10

## TL;DR

This paper introduces a new vibration compensation system for electron beam inspection equipment, improving precision and performance in semiconductor manufacturing.

## Contribution

The novel contribution is a high-speed, high-precision vibration compensation system for multi-frequency disturbances in electron beam inspection.

## Key findings

- The system achieves 50-90% attenuation of vibrations below 200 Hz.
- Repetitive compensation accuracy is less than 0.3 nm.
- The system meets industrial stability requirements for production lines.

## Abstract

In the manufacturing process of advanced integrated circuits, electron beam inspection equipment is crucial for yield assurance, while vibration poses a core challenge affecting its precision and speed. Vibrations in production line equipment are mostly multi-frequency; However, research findings in this field remain limited. Moreover, existing compensation schemes often struggle to meet industrial-grade precision and real-time requirements. This paper presents the design and implementation of a high-speed electron beam vibration compensation system based on positioning. The system incorporates state-of-the-art laser positioning and electrostatic scanning deflectors, and features an integrated signal processing and compensation signal output module. The study involved improvements and optimizations to the positioning processing analysis and compensation module, control software and algorithms, and calibration software and algorithms, demonstrating superior performance compared to existing methods. System validation data demonstrates that the proposed scheme effectively compensates for both single-frequency and multi-frequency disturbances at frequencies below 200 Hz, achieving an average attenuation of 50% to 90% and a repetitive compensation accuracy of less than 0.3 nm. These metrics meet the industrial application requirements for electron beam inspection equipment. The overall error in long-term repeatability tests complies with the stability demands of industrial production lines, confirming its practical applicability in production environments.

## Full text

_Full body text omitted from this summary view._ Fetch the complete paper as Markdown: https://tomesphere.com/paper/PMC13028263/full.md

## Figures

3 figures with captions in the complete paper: https://tomesphere.com/paper/PMC13028263/full.md

## References

13 references — full list in the complete paper: https://tomesphere.com/paper/PMC13028263/full.md

---
Source: https://tomesphere.com/paper/PMC13028263