# Stress-Doped Interface Synergy: Unraveling the Atomic-Scale Corrosion Initiation of Al/Al2Cu Interfaces with Fe–Si Additions in Chloride Environments

**Authors:** Shuang Li, Wenyan Wang, Jingpei Xie, Aiqin Wang, Zhiping Mao, Wendong Qin, Qingyuan Guo

PMC · DOI: 10.3390/ma19051026 · 2026-03-06

## TL;DR

This study uses atomic-level simulations to understand how chloride ions cause corrosion at aluminum-copper interfaces, and how adding elements like iron and silicon can influence this process.

## Contribution

The paper introduces a detailed atomic-scale analysis of corrosion initiation at Al/Al2Cu interfaces with Fe–Si additions in chloride environments.

## Key findings

- Cl− adsorption on Al sites shows strong ionic bonding, while on Cu sites it is more covalent.
- Fe/Si doping modulates the electronic structure, with Si enhancing stability and Fe introducing corrosion risks.
- Tensile strain increases surface activity, while compressive strain affects corrosion through a three-stage mechanism.

## Abstract

In this study, first-principles calculations were employed to systematically investigate the adsorption of Cl− on Al2Cu(110) surfaces, clean Al(111)/Al2Cu(110) interfaces, and Fe/Si-doped interfaces, as well as the influence of strain on interfacial electronic structure and corrosion activity. When Cl− is adsorbed on Al sites, the bonding between Cl and Al exhibits strong ionic characteristics with localized charge transfer, while adsorption on Cu sites is characterized by more delocalized, covalent interactions. This competition dictates the site-dependent stability of adsorption. Through geometric–electronic synergy, the interface functions as both a “Cl− enrichment zone” and an “activity source,” significantly favoring Cl− adsorption at high-activity anodic sites such as Al-hole and Al-bridge. Conversely, Cu-top sites maintain a high work function and an inert cathodic nature, facilitating the formation of efficient micro-galvanic couples across the interface. Moreover, Fe/Si doping further modulates the interfacial electronic landscape: Si serves as an effective strengthening element due to its low substitution energy and high stability, while Fe primarily forms a solid solution on the Al side, potentially introducing galvanic corrosion risks. Stress analysis indicates that tensile strain systematically enhances surface activity by lowering the work function, while compressive strain non-monotonically influences corrosion through a three-stage mechanism involving the “densification–cracking–plastic relaxation” of the passive film. These findings elucidate the atomistic origins of corrosion initiation at Cu–Al composite interfaces and provide a theoretical foundation for enhancing corrosion resistance through alloy design and strain engineering.

## Linked entities

- **Chemicals:** Cl− (PubChem CID 312), Fe (PubChem CID 23925), Si (PubChem CID 5461123)

## Full-text entities

- **Chemicals:** Si (MESH:D012825), Cu (MESH:D003300), Al (MESH:D000535), Chloride (MESH:D002712), Al2Cu (-), Cl (MESH:D002713), Fe (MESH:D007501)

## Figures

24 figures with captions in the complete paper: https://tomesphere.com/paper/PMC12985743/full.md

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Source: https://tomesphere.com/paper/PMC12985743